Improved Technique for Extraction of Effective Mobility by Considering Gate Bias-Dependent Inversion Charges in a Floating-Body Si/SiGe pMOSFET

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dc.contributor.authorBae, Hagyoulko
dc.contributor.authorBang, Tewookko
dc.contributor.authorKim, Choong-Kiko
dc.contributor.authorHur, Jaeko
dc.contributor.authorKim, Seyeobko
dc.contributor.authorJeon, Chang-Hoonko
dc.contributor.authorPark, Jun-Youngko
dc.contributor.authorAhn, Dae-Chulko
dc.contributor.authorKim, Gun-Heeko
dc.contributor.authorSon, Yunikko
dc.contributor.authorLee, Jae-Hoonko
dc.contributor.authorKim, Yong-Taikko
dc.contributor.authorRyu, Seong-Wanko
dc.contributor.authorChoi, Yang-Kyuko
dc.date.accessioned2017-05-15T05:17:30Z-
dc.date.available2017-05-15T05:17:30Z-
dc.date.created2017-05-02-
dc.date.created2017-05-02-
dc.date.issued2017-05-
dc.identifier.citationJOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, v.17, no.5, pp.3247 - 3250-
dc.identifier.issn1533-4880-
dc.identifier.urihttp://hdl.handle.net/10203/223654-
dc.description.abstractWe report an accurate extraction technique of effective mobility (mu(eff)) by considering gate-bias (V-GS) dependent effective inversion charges (Q(inv,eff)) as a normalized correction factor (sigma(V-GS)) when using the gate-to-source/drain capacitance-voltage (C-V) measurement in a p-channel Si/SiGe MOSFET with a floating body structure. In the proposed technique, two different capacitance-voltage configurations: a gate-to-source/drain (CG-SD) configuration without body contact and a gate-to-source/drain/body (CG-SDB) configuration with body contact are utilized for the accurate extraction of mu(eff).-
dc.languageEnglish-
dc.publisherAMER SCIENTIFIC PUBLISHERS-
dc.subjectCHANNEL-
dc.subjectENHANCEMENT-
dc.subjectDIELECTRICS-
dc.titleImproved Technique for Extraction of Effective Mobility by Considering Gate Bias-Dependent Inversion Charges in a Floating-Body Si/SiGe pMOSFET-
dc.typeArticle-
dc.identifier.wosid000397855000064-
dc.identifier.scopusid2-s2.0-85015329432-
dc.type.rimsART-
dc.citation.volume17-
dc.citation.issue5-
dc.citation.beginningpage3247-
dc.citation.endingpage3250-
dc.citation.publicationnameJOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY-
dc.identifier.doi10.1166/jnn.2017.14035-
dc.contributor.localauthorChoi, Yang-Kyu-
dc.contributor.nonIdAuthorBang, Tewook-
dc.contributor.nonIdAuthorKim, Seyeob-
dc.contributor.nonIdAuthorPark, Jun-Young-
dc.contributor.nonIdAuthorAhn, Dae-Chul-
dc.contributor.nonIdAuthorKim, Gun-Hee-
dc.contributor.nonIdAuthorSon, Yunik-
dc.contributor.nonIdAuthorLee, Jae-Hoon-
dc.contributor.nonIdAuthorKim, Yong-Taik-
dc.contributor.nonIdAuthorRyu, Seong-Wan-
dc.description.isOpenAccessN-
dc.type.journalArticleArticle-
dc.subject.keywordAuthorSiGe MOSFET-
dc.subject.keywordAuthorEffective Mobility-
dc.subject.keywordAuthorSplit C-V Method-
dc.subject.keywordAuthorEmpirical Modeling-
dc.subject.keywordAuthorEffective Inversion Channel-
dc.subject.keywordPlusCHANNEL-
dc.subject.keywordPlusENHANCEMENT-
dc.subject.keywordPlusDIELECTRICS-
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