Physical design and mask synthesis for directed self-assembly lithography

Abstract

In directed self-assembly lithography (DSAL), contact or via holes are indirectly formed through guide patterns (GPs). Thus the integrity of GPs is very important, in particular when GP shape is large and complex. The limitation in GP shape calls for careful consideration in physical design stage. We address problems of placement optimization and redundant via insertion for DSAL

the problems become more complex when DSAL is used with multiple patterning (MP-DSAL), which are also discussed. We also argue that conventional mask synthesis and veri？cation are obsolete in DSAL. Inverse DSA and inverse lithography are proposed for DSAL mask synthesis, fast veri？cation of GPs based on machine learning technique, and cut mask optimization for MP-DSAL are discussed.