A Block Copolymer with a Huge Block-to-Block Interaction for the Significant Reduction of Line-Edge Fluctuations in Self-Assembled Patterns

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Publisher
한국반도체학회
Issue Date
2016-02-24
Language
English
Citation

제23회 한국 반도체 학술대회

URI
http://hdl.handle.net/10203/219567
Appears in Collection
MS-Conference Papers(학술회의논문)
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