Machine learning (ML)-based lithography optimizations

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dc.contributor.authorShin, Youngsooko
dc.contributor.authorShim, Seongboko
dc.contributor.authorChoi, Suhyeongko
dc.date.accessioned2017-01-03T06:52:22Z-
dc.date.available2017-01-03T06:52:22Z-
dc.date.created2016-11-21-
dc.date.created2016-11-21-
dc.date.created2016-11-21-
dc.date.issued2016-10-25-
dc.identifier.citationIEEE Asia Pacific Conference on Circuits and Systems-
dc.identifier.urihttp://hdl.handle.net/10203/215429-
dc.languageEnglish-
dc.publisherIEEE-
dc.titleMachine learning (ML)-based lithography optimizations-
dc.typeConference-
dc.identifier.wosid000392651200139-
dc.identifier.scopusid2-s2.0-85011026141-
dc.type.rimsCONF-
dc.citation.publicationnameIEEE Asia Pacific Conference on Circuits and Systems-
dc.identifier.conferencecountryKO-
dc.identifier.conferencelocation제주도-
dc.contributor.localauthorShin, Youngsoo-
dc.contributor.nonIdAuthorChoi, Suhyeong-
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