Complex High-Aspect-Ratio Metal Nanostructures by Secondary Sputtering Combined with Block Copolymer Self-Assembly

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dc.contributor.authorJeon, Hwan-Jinko
dc.contributor.authorKim, Ju Youngko
dc.contributor.authorJung, Woo Binko
dc.contributor.authorJeong, Hyeon-Suko
dc.contributor.authorKim, Yun Hoko
dc.contributor.authorShin, Dong Okko
dc.contributor.authorJeong, Seong-Junko
dc.contributor.authorShin, Jonghwako
dc.contributor.authorKim, Sang Oukko
dc.contributor.authorJung, Hee-Taeko
dc.date.accessioned2016-12-01T04:51:01Z-
dc.date.available2016-12-01T04:51:01Z-
dc.date.created2016-11-21-
dc.date.created2016-11-21-
dc.date.issued2016-10-
dc.identifier.citationADVANCED MATERIALS, v.28, no.38, pp.8439 - 8445-
dc.identifier.issn0935-9648-
dc.identifier.urihttp://hdl.handle.net/10203/214445-
dc.description.abstractHigh-resolution (10 nm), high-areal density, high-aspect ratio (>5), and morphologically complex nanopatterns are fabricated from a single conventional block copolymer (BCP) structure with a 70 nm scale resolution and an aspect ratio of 1, through the secondary-sputtering phenomenon during the Ar-ion-bombardment process. This approach provides a foundation for the design of new routes to BCP lithography-
dc.languageEnglish-
dc.publisherWILEY-V C H VERLAG GMBH-
dc.subjectQUANTUM DOTS-
dc.subjectLARGE-AREA-
dc.subjectLITHOGRAPHY-
dc.subjectARRAYS-
dc.subjectTEMPLATES-
dc.subjectPATTERNS-
dc.subjectGRAPHENE-
dc.subjectGOLD-
dc.titleComplex High-Aspect-Ratio Metal Nanostructures by Secondary Sputtering Combined with Block Copolymer Self-Assembly-
dc.typeArticle-
dc.identifier.wosid000386103700013-
dc.identifier.scopusid2-s2.0-84990221214-
dc.type.rimsART-
dc.citation.volume28-
dc.citation.issue38-
dc.citation.beginningpage8439-
dc.citation.endingpage8445-
dc.citation.publicationnameADVANCED MATERIALS-
dc.identifier.doi10.1002/adma.201602523-
dc.contributor.localauthorShin, Jonghwa-
dc.contributor.localauthorKim, Sang Ouk-
dc.contributor.localauthorJung, Hee-Tae-
dc.contributor.nonIdAuthorJeong, Hyeon-Su-
dc.contributor.nonIdAuthorKim, Yun Ho-
dc.contributor.nonIdAuthorShin, Dong Ok-
dc.type.journalArticleArticle-
dc.subject.keywordAuthorblock copolymers-
dc.subject.keywordAuthorhigh aspect ratio-
dc.subject.keywordAuthorhigh resolution-
dc.subject.keywordAuthorplasma reaction-
dc.subject.keywordAuthorsecondary sputtering-
dc.subject.keywordPlusQUANTUM DOTS-
dc.subject.keywordPlusLARGE-AREA-
dc.subject.keywordPlusLITHOGRAPHY-
dc.subject.keywordPlusARRAYS-
dc.subject.keywordPlusTEMPLATES-
dc.subject.keywordPlusPATTERNS-
dc.subject.keywordPlusGRAPHENE-
dc.subject.keywordPlusGOLD-
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