DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim, Eun Sung | ko |
dc.contributor.author | Kim, Yong Min | ko |
dc.contributor.author | Choi, Kyung Cheol | ko |
dc.date.accessioned | 2016-11-09T06:25:46Z | - |
dc.date.available | 2016-11-09T06:25:46Z | - |
dc.date.created | 2016-02-23 | - |
dc.date.created | 2016-02-23 | - |
dc.date.issued | 2016-10 | - |
dc.identifier.citation | PLASMONICS, v.11, no.5, pp.1337 - 1342 | - |
dc.identifier.issn | 1557-1955 | - |
dc.identifier.uri | http://hdl.handle.net/10203/213860 | - |
dc.description.abstract | Surface plasmon lithography is potentially an alternative technique for high resolution patterning. However, implementation involves high cost and challenging fabrication steps. Here, we report nano-patterning assisted by surface plasmons with a perfectly contacted mask using colloidal lithography. A nano-scaled aluminum mask was fabricated using closed packed polystyrene spheres with a simple, fast, and low-cost method, and the loss of surface plasmon waves was reduced by the perfect contact between the mask and the photoresist. A photoresist pattern of two-dimensional hexagonal annular ring arrays was produced by illuminating light of 436 nm wavelength, and the width of the obtained annular ring was approximately lambda/6. The simulation results showed that the proposed structure had a sufficiently high contrast value for lithography, and the fabrication patterns and the simulation results presented good agreement. | - |
dc.language | English | - |
dc.publisher | SPRINGER | - |
dc.subject | INTERFERENCE LITHOGRAPHY | - |
dc.subject | BLOCK-COPOLYMERS | - |
dc.subject | NM | - |
dc.subject | NANOLITHOGRAPHY | - |
dc.subject | RESOLUTION | - |
dc.subject | PHOTOLITHOGRAPHY | - |
dc.subject | RESONANCE | - |
dc.subject | LIMITS | - |
dc.title | Surface plasmon-assisted nano-lithography with a perfect contact aluminum mask of a hexagonal dot array | - |
dc.type | Article | - |
dc.identifier.wosid | 000383857400022 | - |
dc.identifier.scopusid | 2-s2.0-84955311584 | - |
dc.type.rims | ART | - |
dc.citation.volume | 11 | - |
dc.citation.issue | 5 | - |
dc.citation.beginningpage | 1337 | - |
dc.citation.endingpage | 1342 | - |
dc.citation.publicationname | PLASMONICS | - |
dc.identifier.doi | 10.1007/s11468-016-0180-y | - |
dc.contributor.localauthor | Choi, Kyung Cheol | - |
dc.type.journalArticle | Article | - |
dc.subject.keywordAuthor | Surface plasmon | - |
dc.subject.keywordAuthor | Photolithography | - |
dc.subject.keywordAuthor | Colloidal lithography | - |
dc.subject.keywordPlus | INTERFERENCE LITHOGRAPHY | - |
dc.subject.keywordPlus | BLOCK-COPOLYMERS | - |
dc.subject.keywordPlus | NM | - |
dc.subject.keywordPlus | NANOLITHOGRAPHY | - |
dc.subject.keywordPlus | RESOLUTION | - |
dc.subject.keywordPlus | PHOTOLITHOGRAPHY | - |
dc.subject.keywordPlus | RESONANCE | - |
dc.subject.keywordPlus | LIMITS | - |
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