Vertical Single-Walled Carbon Nanotube Arrays via Block Copolymer Lithography

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dc.contributor.authorLee, Duck Hyun-
dc.contributor.authorLee, Won Jong-
dc.contributor.authorKim, Sang Ouk-
dc.date.accessioned2010-12-22T06:31:11Z-
dc.date.available2010-12-22T06:31:11Z-
dc.date.issued2009-
dc.identifier.citationChemistry of Materials, Vol.21, pp.1368-1374en
dc.identifier.urihttp://hdl.handle.net/10203/21176-
dc.description.abstractThe growth of vertical single-walled carbon nanotube (SWNT) arrays of uniform aerial distribution is achieved by oxygen assisted plasma enhanced chemical vapor deposition (PECVD) growth from nanopatterned catalyst arrays prepared by block copolymer lithography. Block copolymer lithography is an attractive nanopatterning method for generating a uniform catalyst particle array for carbon nanotube growth. Nevertheless, the scale of the catalyst particles patterned by block copolymer lithography is usually not small enough for SWNT growth. In this work, various methods to reduce the catalyst size have been investigated for SWNT growth. Nanopatterned iron catalyst arrays having a mean diameter of 9 nm were prepared via tilted evaporation of thin iron catalyst films over a block copolymer template with the nanopore size of 20 nm, followed by heat treatment at 600 °C. The catalyst particle size was further reduced to the size required for SWNT growth (∼3 nm) by the following two methods. In method i, the catalyst particles were sequentially annealed at 800 °C first in air and then in an H2 atmosphere. The evaporation of iron atoms and subsequent reduction during heat treatment produced catalyst particles sufficiently small for SWNT growth. In method ii, an Al layer was deposited over the catalyst array, which decreased the exposed area of the catalyst particles. The effective catalyst particle size was thus reduced, which enabled the growth of SWNTs.en
dc.description.sponsorshipThis work was supported by the Center for Electronic Packaging Materials (ERC) (R11-2000-085- 08004-0), World Class University (WCU) program (R32-2008- 000-10051-0), the Korea Science and Engineering Foundation (KOSEF) (R11-2008-058-03002-0), the National Research Laboratory Program (R0A-2008-000-20057-0), the second stage of the Brain Korea 21 project, and the 21st Century Frontier Research Programs (Center for Nanoscale Mechatronics & Manufacturing, 08K1401-01010), funded by the Korean government (MEST).en
dc.language.isoen_USen
dc.publisherAmerican Chemical Societyen
dc.titleVertical Single-Walled Carbon Nanotube Arrays via Block Copolymer Lithographyen
dc.typeArticleen

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