Measurement and analysis of electron-neutral collision frequency in the calibrated cutoff probe

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dc.contributor.authorYou, KHko
dc.contributor.authorYou, SJko
dc.contributor.authorKim, DWko
dc.contributor.authorNa, Byungkeunko
dc.contributor.authorSeo, BHko
dc.contributor.authorKim, JHko
dc.contributor.authorChang, Hongyoungko
dc.date.accessioned2016-07-07T04:58:14Z-
dc.date.available2016-07-07T04:58:14Z-
dc.date.created2016-06-13-
dc.date.created2016-06-13-
dc.date.issued2016-03-
dc.identifier.citationPHYSICS OF PLASMAS, v.23, no.3, pp.033509-
dc.identifier.issn1070-664X-
dc.identifier.urihttp://hdl.handle.net/10203/209752-
dc.description.abstractAs collisions between electrons and neutral particles constitute one of the most representative physical phenomena in weakly ionized plasma, the electron-neutral (e-n) collision frequency is a very important plasma parameter as regards understanding the physics of this material. In this paper, we measured the e-n collision frequency in the plasma using a calibrated cutoff-probe. A highly accurate reactance spectrum of the plasma/cutoff-probe system, which is expected based on previous cutoff-probe circuit simulations [Kim et al., Appl. Phys. Lett. 99, 131502 (2011)], is obtained using the calibrated cutoff-probe method, and the e-n collision frequency is calculated based on the cutoff-probe circuit model together with the high-frequency conductance model. The measured e-n collision frequency (by the calibrated cutoff-probe method) is compared and analyzed with that obtained using a Langmuir probe, with the latter being calculated from the measured electron-energy distribution functions, in wide range of gas pressure. (C) 2016 AIP Publishing LLC-
dc.languageEnglish-
dc.publisherAMER INST PHYSICS-
dc.subjectDENSITY-
dc.subjectPLASMAS-
dc.subjectCONDUCTIVITY-
dc.titleMeasurement and analysis of electron-neutral collision frequency in the calibrated cutoff probe-
dc.typeArticle-
dc.identifier.wosid000375854900091-
dc.identifier.scopusid2-s2.0-84961635249-
dc.type.rimsART-
dc.citation.volume23-
dc.citation.issue3-
dc.citation.beginningpage033509-
dc.citation.publicationnamePHYSICS OF PLASMAS-
dc.identifier.doi10.1063/1.4943876-
dc.contributor.localauthorChang, Hongyoung-
dc.contributor.nonIdAuthorYou, KH-
dc.contributor.nonIdAuthorYou, SJ-
dc.contributor.nonIdAuthorKim, DW-
dc.contributor.nonIdAuthorSeo, BH-
dc.contributor.nonIdAuthorKim, JH-
dc.type.journalArticleArticle-
dc.subject.keywordPlusDENSITY-
dc.subject.keywordPlusPLASMAS-
dc.subject.keywordPlusCONDUCTIVITY-
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