원자층 증착 방법을 이용한 낮은 일함수를 갖는 탄화에르븀 박막 증착 및 에르븀저마나이드 형성에 대한 연구 = Atomic layer deposition of erbium carbide film for n-type workfunction metal and erbium germanide

Cited 0 time in webofscience Cited 0 time in scopus
  • Hit : 217
  • Download : 0
Advisors
조병진researcherCho, Byung Jinresearcher
Description
한국과학기술원 :전기및전자공학과
Publisher
한국과학기술원
Issue Date
2015
Identifier
325007
Language
kor
Description

학위논문(석사) - 한국과학기술원 : 전기및전자공학과, 2015.2 ,[vii, 63. :]

Keywords

원자층 증착 방법; 일함수; 에르븀; 탄화에르븀; 에르븀저마나이드; Metal ALD; Tris(isopropylcyclopentadienyl)erbium; Workfunction; Erbium; Erbium carbide; Erbium di-carbide; Erbium germanide

URI
http://hdl.handle.net/10203/206807
Appears in Collection
EE-Theses_Master(석사논문)
Files in This Item
There are no files associated with this item.

qr_code

  • mendeley

    citeulike


rss_1.0 rss_2.0 atom_1.0