긴 레이저 조사방식에 의한 저밀도 이광자 광중합 영역을 이용한 Sub-100 nm 정밀도의 엠보싱 패턴제작Fabrication of Sub-100 nm Embossing Patterns using Weakly-Polymerized Region via Long-Exposure Technique (LET) in two-Photon Polymerization

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dc.contributor.author임태우ko
dc.contributor.author박상후ko
dc.contributor.author양동열ko
dc.date.accessioned2016-04-20T06:36:44Z-
dc.date.available2016-04-20T06:36:44Z-
dc.date.created2015-12-16-
dc.date.created2015-12-16-
dc.date.issued2007-01-
dc.identifier.citation한국정밀공학회지, v.24, no.1, pp.64 - 70-
dc.identifier.issn1225-9071-
dc.identifier.urihttp://hdl.handle.net/10203/205471-
dc.languageKorean-
dc.publisher한국정밀공학회-
dc.title긴 레이저 조사방식에 의한 저밀도 이광자 광중합 영역을 이용한 Sub-100 nm 정밀도의 엠보싱 패턴제작-
dc.title.alternativeFabrication of Sub-100 nm Embossing Patterns using Weakly-Polymerized Region via Long-Exposure Technique (LET) in two-Photon Polymerization-
dc.typeArticle-
dc.type.rimsART-
dc.citation.volume24-
dc.citation.issue1-
dc.citation.beginningpage64-
dc.citation.endingpage70-
dc.citation.publicationname한국정밀공학회지-
dc.identifier.kciidART001042901-
dc.contributor.localauthor양동열-
dc.contributor.nonIdAuthor임태우-
dc.contributor.nonIdAuthor박상후-
dc.subject.keywordAuthorWeakly-Polymerized Region (저밀도 광중합 영역)-
dc.subject.keywordAuthorTwo-Photon Absorbed Polymerization (이광자 흡수 고화)-
dc.subject.keywordAuthorFemtosecond Laser (펨토초 레이저)-
dc.subject.keywordAuthorLong-Exposure Technique (긴 조사방식)-
dc.subject.keywordAuthorWeakly-Polymerized Region (저밀도 광중합 영역)-
dc.subject.keywordAuthorTwo-Photon Absorbed Polymerization (이광자 흡수 고화)-
dc.subject.keywordAuthorFemtosecond Laser (펨토초 레이저)-
dc.subject.keywordAuthorLong-Exposure Technique (긴 조사방식)-
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