Etch proximity correction through machine-learning-driven etch bias model
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Shim, Seong Bo | ko |
| dc.contributor.author | Shin, Young Soo | ko |
| dc.date.accessioned | 2016-04-18T04:40:26Z | - |
| dc.date.available | 2016-04-18T04:40:26Z | - |
| dc.date.created | 2015-11-23 | - |
| dc.date.created | 2015-11-23 | - |
| dc.date.issued | 2016-02-23 | - |
| dc.identifier.citation | SPIE Advanced Lithography | - |
| dc.identifier.uri | http://hdl.handle.net/10203/204126 | - |
| dc.language | English | - |
| dc.publisher | SPIE | - |
| dc.title | Etch proximity correction through machine-learning-driven etch bias model | - |
| dc.type | Conference | - |
| dc.identifier.wosid | 000388443000014 | - |
| dc.identifier.scopusid | 2-s2.0-84981556642 | - |
| dc.type.rims | CONF | - |
| dc.citation.publicationname | SPIE Advanced Lithography | - |
| dc.identifier.conferencecountry | US | - |
| dc.identifier.conferencelocation | San Jose Marriott and San Jose Convention Center | - |
| dc.contributor.localauthor | Shin, Young Soo | - |
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