Integrated routing and fill for self-aligned double patterning (SADP) using grid-based design

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dc.contributor.authorSong, Young Sooko
dc.contributor.authorLee, Jee Myungko
dc.contributor.authorShin, Young Sooko
dc.date.accessioned2016-04-18T04:40:17Z-
dc.date.available2016-04-18T04:40:17Z-
dc.date.created2015-11-23-
dc.date.created2015-11-23-
dc.date.issued2016-02-24-
dc.identifier.citationSPIE Advanced Lithography-
dc.identifier.urihttp://hdl.handle.net/10203/204125-
dc.languageEnglish-
dc.publisherSPIE-
dc.titleIntegrated routing and fill for self-aligned double patterning (SADP) using grid-based design-
dc.typeConference-
dc.identifier.wosid000382889100004-
dc.identifier.scopusid2-s2.0-84981297860-
dc.type.rimsCONF-
dc.citation.publicationnameSPIE Advanced Lithography-
dc.identifier.conferencecountryUS-
dc.identifier.conferencelocationSan Jose Marriott and San Jose Convention Center-
dc.contributor.localauthorShin, Young Soo-
dc.contributor.nonIdAuthorLee, Jee Myung-
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EE-Conference Papers(학술회의논문)
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