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NO Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date)
Reactive ion etching mechanism of copper film in chlorine-based electron cyclotron resonance plasma

Lee, SK; Chun , Soung Soonresearcher; Hwang, CY; Lee, Won-Jongresearcher, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.36, no.1A, pp.50 - 55, 1997-01

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