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Results 1-2 of 2 (Search time: 0.005 seconds).

NO Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date)
1
THE ADHESION OF LOW-PRESSURE CHEMICALLY VAPOR-DEPOSITED TUNGSTEN FILMS ON SILICON AND SIO2 FOR SIH4-H2-WF6 AND H2-WF6 PROCESSES

PARK, YW; Park, Chong-Ookresearcher; Chun , Soung Soonresearcher, THIN SOLID FILMS, v.201, no.1, pp.167 - 175, 1991-06

2
EFFECTS OF DEPOSITION RATE ON THE ENCROACHMENT IN TUNGSTEN FILMS REDUCED BY H-2

PARK, YW; KIM, IL; Park, Chong-Ookresearcher; Chun , Soung Soonresearcher, JOURNAL OF MATERIALS SCIENCE, v.26, no.19, pp.5318 - 5322, 1991-10

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