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|NO||Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date)|
|1||Effects of the annealing in Ar and H-2/Ar ambients on the microstructure and the electrical resistivity of the copper film prepared by chemical vapor deposition|
Rha, SK; Lee, WJ; Lee, SY; Kim, DW; Park, Chong-Ookresearcher; Chun , Soung Soonresearcher, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.35, no.11, pp.5781 - 5786, 1996-11
|2||Reactive ion etching mechanism of copper film in chlorine-based electron cyclotron resonance plasma|