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| NO | Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date) |
|---|---|
| EFFECTS OF DEPOSITION TEMPERATURE ON THE ELECTRICAL-PROPERTIES OF ELECTRON-CYCLOTRON-RESONANCE PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION TA2O5 FILM AND THE FORMATION OF INTERFACIAL SIO2 KIM, I; KIM, JS; CHO, BW; AHN, SD; Chun , Soung Soon; Lee, Won-Jong, JOURNAL OF MATERIALS RESEARCH, v.10, no.11, pp.2864 - 2869, 1995-11 | |
| EFFECTS OF ANNEALING IN O-2 AND N-2 ON THE ELECTRICAL-PROPERTIES OF TANTALUM OXIDE THIN-FILMS PREPARED BY ELECTRON-CYCLOTRON-RESONANCE PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION Kim, IL; Kim, Jong-Seok; Kwon, Oh-Seung; Ahn, Sung-Tae; Chun , Soung Soon; Lee, Won-Jong, JOURNAL OF ELECTRONIC MATERIALS, v.24, no.10, pp.1435 - 1441, 1995-10 | |
| The effects of substrate temperature and lead precursor flow rate on the fabrication of (Pb,La)(Zr,Ti)O-3 thin films by electron cyclotron resonance plasma-enhanced chemical vapor deposition Shin, JS; Chun , Soung Soon; Lee, Won-Jong, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.36, no.4A, pp.2200 - 2206, 1997-04 | |
| Reactive ion etching mechanism of copper film in chlorine-based electron cyclotron resonance plasma Lee, SK; Chun , Soung Soon; Hwang, CY; Lee, Won-Jong, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.36, no.1A, pp.50 - 55, 1997-01 | |
| PROPERTIES OF ALUMINUM-OXIDE FILMS PREPARED BY PLASMA-ENHANCED METAL ORGANIC-CHEMICAL VAPOR-DEPOSITION KANG, CJ; Chun , Soung Soon; Lee, Won-Jong, THIN SOLID FILMS, v.189, no.1, pp.161 - 173, 1990-08 | |
| PITTING RESISTANCE OF TIN DEPOSITED ON INCONEL-600 BY PLASMA-ASSISTED CHEMICAL-VAPOR-DEPOSITION In, C.B.; Kim, S.P.; Kim, Y.I.; Kim, W.W.; Kuk, I.H.; Chun , Soung Soon; Lee, Won-Jong, JOURNAL OF NUCLEAR MATERIALS, v.211, no.3, pp.223 - 230, 1994 | |
| CHARACTERIZATION OF PBTIO3 THIN-FILMS DEPOSITED ON PT/TI/SIO2/SI SUBSTRATES BY ECR PECVD CHUNG, SW; SHIN, JS; KIM, JW; No, Kwangsoo; Chun , Soung Soon; Lee, Won-Jong, JOURNAL OF MATERIALS RESEARCH, v.10, no.2, pp.447 - 452, 1995-02 | |
| COMPOSITIONAL AND STRUCTURAL-ANALYSIS OF ALUMINUM-OXIDE FILMS PREPARED BY PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION KIM, YC; PARK, HH; Chun , Soung Soon; Lee, Won-Jong, THIN SOLID FILMS, v.237, no.1-2, pp.57 - 65, 1994-01 |