| 11 | The Effect of Reactant Gases Composition on The PECVD of TiN Chun , Soung Soon, THIN SOLID FILMS, v.169, no.1, pp.57 - 68, 1989 |
| 12 | LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION OF BLANKET TUNGSTEN USING A GASEOUS MIXTURE OF WF6, SIH4, AND H2 PARK, HL; YOON, SS; Park, Chong-Ook; Chun , Soung Soon, THIN SOLID FILMS, v.181, no.1, pp.85 - 93, 1989-12 |
| 13 | A Study on the Tool Life on TiC and TiC Plus Al2O3 CVD Tungsten Carbide Tool Kim, NH; Chun , Soung Soon, JOURNAL OF MATERIALS SCIENCE, v.20, pp.1285 - 1290, 1985 |
| 14 | The Bond Structures and Properties of Chemically Vapor Deposited Amorphous SiC Park, YJ; Park, YW; Chun , Soung Soon, THIN SOLID FILMS, v.166, no.1, pp.367 - 374, 1988-02 |
| 15 | The Effect of Ultrasonic Vibration on Hard Chromium Plating in a Modified Self-Regulating High Speed Bath Chun , Soung Soon, THIN SOLID FILMS, v.120, no.2, pp.153 - 159, 1984-10 |
| 16 | THE EFFECTS OF DEPOSITION VARIABLES ON DEPOSITION RATE IN THE CHEMICAL VAPOR-DEPOSITION OF SILICON-NITRIDE YI, KS; KIM, JB; KIM, KJ; Chun , Soung Soon, THIN SOLID FILMS, v.155, no.1, pp.87 - 95, 1987-12 |
| 17 | The Effects of Deposition Variables on the Electrical Properties of Silicon Nitride by CVD Chun , Soung Soon, JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A, v.6, pp.3082, 1986 |
| 18 | EFFECTS OF THE EXPERIMENTAL CONDITIONS OF CHEMICAL VAPOR-DEPOSITION ON A TIC/TIN DOUBLE-LAYER COATING KIM, MS; Chun , Soung Soon, THIN SOLID FILMS, v.107, no.2, pp.129 - 139, 1983 |
| 19 | Dependence of oxygen redistribution on titanium film thickness during titanium silicide formation by rapid thermal annealing Kang, S.W.; Park, Sin Chong; Chun , Soung Soon, JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, v.7, no.6, pp.3246 - 3250, 1989-11 |
| 20 | Growth and Structure of Chemical Vapor Deposited Silicon Carbide from Methyltrichlorosilane and Hydrogen in the Temperature Range of 1100 to 1400oC Chun , Soung Soon, JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A, v.6, no.1, pp.5 - 8, 1988-01 |
