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Silicide Formation Process of Er Films with Ta and TaN Capping Layers Choi, Juyun; Choi, Seongheum; Kim, Jungwoo; Na, Sekwon; Lee, Jeong-Hoo; Lee, Seok-Hee; Kim, Hyoungsub, ACS APPLIED MATERIALS & INTERFACES, v.5, no.23, pp.12744 - 12750, 2013-12 |
Ultralow-k Amorphous Boron Nitride Film for Copper Interconnect Capping Layer Kim, Kiryong; Kim, Hyeongjoon; Lee, Sun-Woo; Lee, Min Yung; Lee, Gyusoup; Park, Youngkeun; Kim, Heetae; et al, IEEE TRANSACTIONS ON ELECTRON DEVICES, v.70, no.5, pp.2588 - 2593, 2023-05 |
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