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Annealing and oxidation of silicon oxide films prepared by plasma-enhanced chemical vapor deposition Chen, XY; Lu, YF; Tang, LJ; Wu, YH; Cho, Byung Jin; Xu, XJ; Dong, JR; et al, JOURNAL OF APPLIED PHYSICS, v.97, no.1, 2005-01 |
Optical properties of SiOx nanostructured films by pulsed-laser deposition at different substrate temperatures Chen, XY; Lu, YF; Wu, YH; Cho, Byung Jin; Song, WD; Dai, DY, JOURNAL OF APPLIED PHYSICS, v.96, no.6, pp.3180 - 3186, 2004-09 |
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