Browse "School of Electrical Engineering(전기및전자공학부)" by Subject Atomic layer deposition▼aNickel▼aNickel-germanide▼aWorkfunction▼aSpecific contact resistivity▼aImplantation after germanidation▼aSchottky barrier height▼aLogic device▼aMemory device
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| Atomic layer deposition of nickel and nickel germanide for next generation 3D devices = 차세대 3D 반도체 소자 적용을 위한 니켈의 원자층 증착 방법 공정 개발 및 니켈-저마나이드 형성link Ahn, Hyun Jun; Cho, Byung Jin; et al, 한국과학기술원, 2020 |
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