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Characterization of Ultrathin Plasma Nitrided Gate Dielectrics in PMOSFET for 0.18µm Technology and Beyond Cho, Byung Jin; Tan, SS; Ang, CH; Lek, CM; Chen, T; See, A; Chan, L, 9th International Symp. on the Physical and Failure Analysis of Integrated Circuits (IPFA), pp.254 - 254, 2002-07-08 |
Electrical evaluation of laser annealed junctions by Hall measurement Cho, Byung Jin; Poon, DCH; Tan, LS; Bhat, M; Chan, L, 2nd International Conference on Materials for Advanced Technologies, pp.578 - 578, 2003-12-11 |
Formation of Phosphorus-doped shallow source/drain junctions for Ge MOSFET Cho, Byung Jin; Poon, D; Tan, LS; Du, AY; Chan, L, 3rd International Conference on Materials for Advanced Technologies, pp.5 - 5, 2005-07-03 |
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