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A novel X-ray mask concept for mixmatch lithography fabrication of MOS devices by synchrotron radiation lithography. DiFabrizio, E; Grella, L; Gentili, M; Baciocchi, M; Mastrogiacomo, L; Choi, Sang-Soo; Jeon,Young Jin; et al, MICROELECTRONIC ENGINEERING, v.35, no.1-4, pp.553 - 556, 1997-02 |
Exposure latitude and CD control study for additively patterned x-ray mask with GBit DRAM complexity. Baciocchi, M; DiFabrizio, E; Gentili, M; Grella, L; Maggiora, L; Mastrogiacomo, L; Peschiaroli, D; et al, MICROELECTRONIC ENGINEERING, v.30, no.1-4, pp.195 - 198, 1996-01 |
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