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Selective use of stitch-induced via for V0 mask reduction: standard cell design and placement optimization Hyun, Dai Joon; Jung, Younggwang; Shin, Youngsoo, IEICE TRANSACTIONS ON FUNDAMENTALS OF ELECTRONICS COMMUNICATIONS AND COMPUTER SCIENCES, v.E102.A, no.12, pp.1711 - 1719, 2019-12 |
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