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Dependence of chemical composition ratio on electrical properties of HfO2-A(2)O(3) gate dielectric Joo MS; Cho, Byung Jin; Yeo CC; Wu N; Yu HY; Zhu CX; Li MF; et al, JAPANESE JOURNAL OF APPLIED PHYSICS, v.42, no.3A, pp.220 - 222, 2003-03 |
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