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Dependence of hydrogen and oxygen incorporation on deposition parameters in photochemical vapor deposited mercury free silicon nitride films Sahu, BS; Srivastava, P; Agnihotri, OP; Lee, Hee Chul; Sekhar, BR; Mahapatra, S, THIN SOLID FILMS, v.446, pp.23 - 28, 2004-01 |
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