POSS hybrid resists containing diazoketo groups for UV curing nanoimprint lithography(UV-NIL)
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Shin, Seung Min | - |
| dc.contributor.author | 우승아 | - |
| dc.contributor.author | 김진백 | - |
| dc.date.accessioned | 2015-05-15T08:23:15Z | - |
| dc.date.available | 2015-05-15T08:23:15Z | - |
| dc.date.created | 2014-01-10 | - |
| dc.date.issued | 2013-10-11 | - |
| dc.identifier.citation | 2013 추계 한국고분자학회 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/198453 | - |
| dc.language | Korean | - |
| dc.publisher | 대한 고분자 학회 | - |
| dc.title | POSS hybrid resists containing diazoketo groups for UV curing nanoimprint lithography(UV-NIL) | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.publicationname | 2013 추계 한국고분자학회 | - |
| dc.identifier.conferencecountry | KO | - |
| dc.contributor.localauthor | Shin, Seung Min | - |
| dc.contributor.localauthor | 김진백 | - |
| dc.contributor.nonIdAuthor | 우승아 | - |
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