Conductive line patterns were printed on a poly-dimethylsiloxane (PDMS) substrate using a gravure printing method with conductive silver ink. A plate-to-roll gravure print was prepared for this experiment. Gravure plates with fine lines 5-25 mu m in width and 0-90 degrees in tilted angles were fabricated using photolithography techniques. The printability, defined as the ratio of the real printed area to the ideal printed area, was measured and analyzed with respect to the process parameters and the line pattern designs. The effect of the process parameters on the fine line patterning was discussed, including the wiping condition, the printing pressure and the printing speed. The printability of the high adhesive substrate was examined by preparing a nanostructured PDMS substrate featuring a forest of 200 nm nanopillars using an anodic aluminum oxide (AAO) template. The patterns printed onto the nanostructured PDMS were compared with those printed on a flat PDMS substrate.