DC Field | Value | Language |
---|---|---|
dc.contributor.advisor | Jung, Yeon-Sik | - |
dc.contributor.advisor | 정연식 | - |
dc.contributor.author | Lee, Jung-Hye | - |
dc.contributor.author | 이정혜 | - |
dc.date.accessioned | 2015-04-23T07:11:06Z | - |
dc.date.available | 2015-04-23T07:11:06Z | - |
dc.date.issued | 2014 | - |
dc.identifier.uri | http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=592354&flag=dissertation | - |
dc.identifier.uri | http://hdl.handle.net/10203/197357 | - |
dc.description | 학위논문(석사) - 한국과학기술원 : 신소재공학과, 2014.8, [ v, 54 p. ] | - |
dc.description.abstract | Self-assembled block copolymer (BCP) thin films have been extensively studied for applications involving the generation of functional nanostructures. Moreover, directed self-assembly (DSA) based on BCPs with excellent pattern resolution, cost-effectiveness, and scalability is a practical method for complementing optical lithography. Si-containing BCPs such as poly(styrene-block-dimethylsiloxane) (PS-b-PDMS) can provide sub-20 nm resolution with long range ordering and high etch resistance. However, the difficulty in achieving perpendicularly oriented micro-domains due to the large difference of surface energy between the two blocks limits aspect-ratio (AR) for the subsequent pattern transfer process. We introduce a way to enhance the AR of the self-assembled patterns obtained from cylinder-forming PS-b-PDMS BCPs by preparing thick PS brush layers underneath, successfully achieving ARs of 1.4-3.5. Moreover, nano-scale Si topographic patterns with AR of 4.1 obtained using the HAR patterns as an etch mask are also demonstrated. This study suggests a facile self-assembly methodology to obtain practical nano-patterns | eng |
dc.language | eng | - |
dc.publisher | 한국과학기술원 | - |
dc.subject | extremely long chain brush | - |
dc.subject | PS-b-PDMS | - |
dc.subject | 블록 공중합체 | - |
dc.subject | 높은 종횡비 | - |
dc.subject | 긴 사슬 브러쉬 | - |
dc.subject | PS-b-PDMS | - |
dc.subject | thick brush | - |
dc.subject | high-aspect-ratio | - |
dc.subject | directed self-assembly | - |
dc.title | Aspect-ratio enhancement of directed self-assembly patterns using extremely long chain polymer brush | - |
dc.title.alternative | 긴 사슬 브러쉬를 이용한 DSA 패턴의 종횡비 향상에 관한 연구 | - |
dc.type | Thesis(Master) | - |
dc.identifier.CNRN | 592354/325007 | - |
dc.description.department | 한국과학기술원 : 신소재공학과, | - |
dc.identifier.uid | 020124507 | - |
dc.contributor.localauthor | Jung, Yeon-Sik | - |
dc.contributor.localauthor | 정연식 | - |
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