DC Field | Value | Language |
---|---|---|
dc.contributor.author | Yoon, Seong Jun | ko |
dc.contributor.author | Choi, Sung-Yool | ko |
dc.contributor.author | Cho, Byung-Jin | ko |
dc.date.accessioned | 2014-12-08T08:00:16Z | - |
dc.date.available | 2014-12-08T08:00:16Z | - |
dc.date.created | 2014-09-11 | - |
dc.date.created | 2014-09-11 | - |
dc.date.issued | 2014-05-06 | - |
dc.identifier.citation | Graphene 2014 | - |
dc.identifier.uri | http://hdl.handle.net/10203/191328 | - |
dc.language | English | - |
dc.publisher | Graphene 2014 | - |
dc.title | Effect of Reduced Graphene Oxide Cap Layer on Electromigration Reliability of Cu Interconnect | - |
dc.type | Conference | - |
dc.type.rims | CONF | - |
dc.citation.publicationname | Graphene 2014 | - |
dc.identifier.conferencecountry | FR | - |
dc.identifier.conferencelocation | Toulouse | - |
dc.embargo.liftdate | 9999-12-31 | - |
dc.embargo.terms | 9999-12-31 | - |
dc.contributor.localauthor | Choi, Sung-Yool | - |
dc.contributor.localauthor | Cho, Byung-Jin | - |
dc.contributor.nonIdAuthor | Yoon, Seong Jun | - |
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