Strain- and surface-induced modification of photoluminescence from self-assembled GaN/Al0.5Ga0.5N quantum dots: strong effect of capping layer and atmospheric condition

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We report on the influence of a capping layer on the photoluminescence properties of self-assembled GaN quantum dots grown on an Al0.5Ga0.5N template. Self-assembled GaN quantum dots show a large quantum confined Stark shift and long carrier recombination time due to strong built-in spontaneous and piezoelectric polarization fields. Nevertheless, owing to strong carrier localization and suppressed nonradiative processes, these quantum dots have a high-quantum efficiency even at room temperature. Here, we show that the capping thickness has an important role on the optical properties of the GaN quantum dots. The radiative and nonradiative recombination processes of quantum dots are strongly affected by adjusting the capping thickness, and the GaN quantum dots with 12 monolayers-thick Al0.5Ga0.5N capping layer show a remarkably high internal quantum efficiency of more than 80% at room temperature. We also studied photoluminescence quenching and enhancement for surface (uncapped) quantum dots caused by photoadsorption and photodesorption of oxygen.
Publisher
IOP PUBLISHING LTD
Issue Date
2014-08
Language
English
Article Type
Article
Keywords

LIGHT-EMITTING-DIODES; III-V NITRIDES; OPTICAL-PROPERTIES; WELL STRUCTURES; GAN; POLARIZATION; EMISSION; SINGLE; BLUE

Citation

NANOTECHNOLOGY, v.25, no.30, pp.305703-1 - 305703-11

ISSN
0957-4484
DOI
10.1088/0957-4484/25/30/305703
URI
http://hdl.handle.net/10203/190044
Appears in Collection
PH-Journal Papers(저널논문)
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