Conformal phase masks made of polyurethane acrylate with optimized elastic modulus for 3D nanopatterning

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dc.contributor.authorPark, Junyongko
dc.contributor.authorTahk, Donghako
dc.contributor.authorAhn, Changuiko
dc.contributor.authorIm, SungGapko
dc.contributor.authorChoi, Se-Jinko
dc.contributor.authorSuh, Khap-Yangko
dc.contributor.authorJeon, Seokwooko
dc.date.accessioned2014-08-29T01:55:39Z-
dc.date.available2014-08-29T01:55:39Z-
dc.date.created2014-04-22-
dc.date.created2014-04-22-
dc.date.issued2014-01-
dc.identifier.citationJOURNAL OF MATERIALS CHEMISTRY C, v.2, no.13, pp.2316 - 2322-
dc.identifier.issn2050-7526-
dc.identifier.urihttp://hdl.handle.net/10203/188905-
dc.description.abstractThe pattern resolution of soft lithographic techniques is critically determined by the elastic modulus of the soft mold that can support fine and high-aspect-ratio features with conformal adhesion to target substrates. We present a strategy to fine-tune the elastic modulus of conformal molds made of polyurethane acrylate by optimizing the chemical structures and the composition of prepolymer and modulator. Trimethylolpropane ethoxylated (15) triacrylate plays a key role as a delicate modulator for increasing the elastic modulus of soft aliphatic urethane diacrylate oligomer with its low cross-linking density. The optimized molds have sufficiently high elastic modulus (>23 MPa) for defect-free replication of dense, high-aspect-ratio (>2) nanopillars and nanotrench structures while still preserving their conformality. The conformal mold with good mechanical and optical properties can serve as a semi-permanently usable optical phase mask with a wide range of phase modulations for generating three-dimensional (3D) nanostructures with high precision.-
dc.languageEnglish-
dc.publisherROYAL SOC CHEMISTRY-
dc.subject3-DIMENSIONAL NANOSTRUCTURES-
dc.subjectSOFT LITHOGRAPHY-
dc.subjectSTAMPS-
dc.subjectMOLD-
dc.subjectRESOLUTION-
dc.subjectABSORPTION-
dc.subjectCOLLAPSE-
dc.subjectFEATURES-
dc.subjectARRAYS-
dc.subjectSTEP-
dc.titleConformal phase masks made of polyurethane acrylate with optimized elastic modulus for 3D nanopatterning-
dc.typeArticle-
dc.identifier.wosid000332482400006-
dc.identifier.scopusid2-s2.0-84896756663-
dc.type.rimsART-
dc.citation.volume2-
dc.citation.issue13-
dc.citation.beginningpage2316-
dc.citation.endingpage2322-
dc.citation.publicationnameJOURNAL OF MATERIALS CHEMISTRY C-
dc.identifier.doi10.1039/c3tc32194k-
dc.contributor.localauthorIm, SungGap-
dc.contributor.localauthorJeon, Seokwoo-
dc.contributor.nonIdAuthorTahk, Dongha-
dc.contributor.nonIdAuthorChoi, Se-Jin-
dc.contributor.nonIdAuthorSuh, Khap-Yang-
dc.type.journalArticleArticle-
dc.subject.keywordPlus3-DIMENSIONAL NANOSTRUCTURES-
dc.subject.keywordPlusSOFT LITHOGRAPHY-
dc.subject.keywordPlusSTAMPS-
dc.subject.keywordPlusMOLD-
dc.subject.keywordPlusRESOLUTION-
dc.subject.keywordPlusABSORPTION-
dc.subject.keywordPlusCOLLAPSE-
dc.subject.keywordPlusFEATURES-
dc.subject.keywordPlusARRAYS-
dc.subject.keywordPlusSTEP-
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CBE-Journal Papers(저널논문)MS-Journal Papers(저널논문)
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