DC Field | Value | Language |
---|---|---|
dc.contributor.author | Park, Junyong | ko |
dc.contributor.author | Tahk, Dongha | ko |
dc.contributor.author | Ahn, Changui | ko |
dc.contributor.author | Im, SungGap | ko |
dc.contributor.author | Choi, Se-Jin | ko |
dc.contributor.author | Suh, Khap-Yang | ko |
dc.contributor.author | Jeon, Seokwoo | ko |
dc.date.accessioned | 2014-08-29T01:55:39Z | - |
dc.date.available | 2014-08-29T01:55:39Z | - |
dc.date.created | 2014-04-22 | - |
dc.date.created | 2014-04-22 | - |
dc.date.issued | 2014-01 | - |
dc.identifier.citation | JOURNAL OF MATERIALS CHEMISTRY C, v.2, no.13, pp.2316 - 2322 | - |
dc.identifier.issn | 2050-7526 | - |
dc.identifier.uri | http://hdl.handle.net/10203/188905 | - |
dc.description.abstract | The pattern resolution of soft lithographic techniques is critically determined by the elastic modulus of the soft mold that can support fine and high-aspect-ratio features with conformal adhesion to target substrates. We present a strategy to fine-tune the elastic modulus of conformal molds made of polyurethane acrylate by optimizing the chemical structures and the composition of prepolymer and modulator. Trimethylolpropane ethoxylated (15) triacrylate plays a key role as a delicate modulator for increasing the elastic modulus of soft aliphatic urethane diacrylate oligomer with its low cross-linking density. The optimized molds have sufficiently high elastic modulus (>23 MPa) for defect-free replication of dense, high-aspect-ratio (>2) nanopillars and nanotrench structures while still preserving their conformality. The conformal mold with good mechanical and optical properties can serve as a semi-permanently usable optical phase mask with a wide range of phase modulations for generating three-dimensional (3D) nanostructures with high precision. | - |
dc.language | English | - |
dc.publisher | ROYAL SOC CHEMISTRY | - |
dc.subject | 3-DIMENSIONAL NANOSTRUCTURES | - |
dc.subject | SOFT LITHOGRAPHY | - |
dc.subject | STAMPS | - |
dc.subject | MOLD | - |
dc.subject | RESOLUTION | - |
dc.subject | ABSORPTION | - |
dc.subject | COLLAPSE | - |
dc.subject | FEATURES | - |
dc.subject | ARRAYS | - |
dc.subject | STEP | - |
dc.title | Conformal phase masks made of polyurethane acrylate with optimized elastic modulus for 3D nanopatterning | - |
dc.type | Article | - |
dc.identifier.wosid | 000332482400006 | - |
dc.identifier.scopusid | 2-s2.0-84896756663 | - |
dc.type.rims | ART | - |
dc.citation.volume | 2 | - |
dc.citation.issue | 13 | - |
dc.citation.beginningpage | 2316 | - |
dc.citation.endingpage | 2322 | - |
dc.citation.publicationname | JOURNAL OF MATERIALS CHEMISTRY C | - |
dc.identifier.doi | 10.1039/c3tc32194k | - |
dc.contributor.localauthor | Im, SungGap | - |
dc.contributor.localauthor | Jeon, Seokwoo | - |
dc.contributor.nonIdAuthor | Tahk, Dongha | - |
dc.contributor.nonIdAuthor | Choi, Se-Jin | - |
dc.contributor.nonIdAuthor | Suh, Khap-Yang | - |
dc.type.journalArticle | Article | - |
dc.subject.keywordPlus | 3-DIMENSIONAL NANOSTRUCTURES | - |
dc.subject.keywordPlus | SOFT LITHOGRAPHY | - |
dc.subject.keywordPlus | STAMPS | - |
dc.subject.keywordPlus | MOLD | - |
dc.subject.keywordPlus | RESOLUTION | - |
dc.subject.keywordPlus | ABSORPTION | - |
dc.subject.keywordPlus | COLLAPSE | - |
dc.subject.keywordPlus | FEATURES | - |
dc.subject.keywordPlus | ARRAYS | - |
dc.subject.keywordPlus | STEP | - |
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