Doping suppression and mobility enhancement of graphene transistors fabricated using an adhesion promoting dry transfer process

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dc.contributor.authorShin, Woo Cheolko
dc.contributor.authorYoon, Taeshikko
dc.contributor.authorMun, Jeong Hunko
dc.contributor.authorKim, Taek Yongko
dc.contributor.authorChoi, Sung-Yoolko
dc.contributor.authorKim, Taek-Sooko
dc.contributor.authorCho, Byung Jinko
dc.date.accessioned2014-08-29T01:18:52Z-
dc.date.available2014-08-29T01:18:52Z-
dc.date.created2014-01-20-
dc.date.created2014-01-20-
dc.date.created2014-01-20-
dc.date.issued2013-12-
dc.identifier.citationAPPLIED PHYSICS LETTERS, v.103, no.24-
dc.identifier.issn0003-6951-
dc.identifier.urihttp://hdl.handle.net/10203/188729-
dc.description.abstractWe present the facile dry transfer of graphene synthesized via chemical vapor deposition on copper film to a functional device substrate. High quality uniform dry transfer of graphene to oxidized silicon substrate was achieved by exploiting the beneficial features of a poly(4-vinylphenol) adhesive layer involving a strong adhesion energy to graphene and negligible influence on the electronic and structural properties of graphene. The graphene field effect transistors (FETs) fabricated using the dry transfer process exhibit excellent electrical performance in terms of high FET mobility and low intrinsic doping level, which proves the feasibility of our approach in graphene-based nanoelectronics.-
dc.languageEnglish-
dc.publisherAMER INST PHYSICS-
dc.titleDoping suppression and mobility enhancement of graphene transistors fabricated using an adhesion promoting dry transfer process-
dc.typeArticle-
dc.identifier.wosid000328706500093-
dc.identifier.scopusid2-s2.0-84890449249-
dc.type.rimsART-
dc.citation.volume103-
dc.citation.issue24-
dc.citation.publicationnameAPPLIED PHYSICS LETTERS-
dc.identifier.doi10.1063/1.4846317-
dc.contributor.localauthorChoi, Sung-Yool-
dc.contributor.localauthorKim, Taek-Soo-
dc.contributor.localauthorCho, Byung Jin-
dc.contributor.nonIdAuthorShin, Woo Cheol-
dc.contributor.nonIdAuthorYoon, Taeshik-
dc.contributor.nonIdAuthorMun, Jeong Hun-
dc.contributor.nonIdAuthorKim, Taek Yong-
dc.type.journalArticleArticle-
dc.subject.keywordPlusHIGH-QUALITY-
dc.subject.keywordPlusFILMS-
dc.subject.keywordPlusTRANSPARENT-
dc.subject.keywordPlusSCATTERING-
dc.subject.keywordPlusENERGY-
dc.subject.keywordPlusCOPPER-
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