Effective fabrication of three-dimensional nano/microstructures in a single step using multilayered stamp

Abstract

A technique in ultraviolet nanoimprint lithography (UV-NIL) for the creation of three-dimensional (3D) nanopatterns in a single step is proposed. The single-step fabrication of 3D or multilevel structures has a multitude of benefits. Inherent in this is the elimination of a need for alignment for multilevel fabrications as well as being a cost effective and simple process. For 3D UV-NIL, a trial in the fabrication of multilayered stamps has been conducted employing two-photon polymerization and diamondlike carbon (DLC) coating technique. The DLC coating layer enables the polymer patterns to be used effectively as a stamp without the need for an antiadhesion material. Additionally, O-2-plasma ashing has the potential for an epoch-making improvement of the precision of polymer patterns with a linewidth of 60 nm. Overall, several fine patterns are imprinted using the multilayered stamp onto a UV-curable resist via a single-step process without any identifiable damage.