Phase shift effect of relief structured phase masks in proximity field nanopatterning근접장 나노패터닝에서 위상차 구조를 갖는 마스크의 단차변화 효과
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.advisor | Jeon, Seok-Woo | - |
| dc.contributor.advisor | 전석우 | - |
| dc.contributor.author | Kim, Eun-Hye | - |
| dc.contributor.author | 김은혜 | - |
| dc.date.accessioned | 2013-09-12T04:46:41Z | - |
| dc.date.available | 2013-09-12T04:46:41Z | - |
| dc.date.issued | 2012 | - |
| dc.identifier.uri | http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=487416&flag=dissertation | - |
| dc.identifier.uri | http://hdl.handle.net/10203/182041 | - |
| dc.description | 학위논문(석사) - 한국과학기술원 : 신소재공학과, 2012.2, [ iv, 44 p. ] | - |
| dc.language | eng | - |
| dc.publisher | 한국과학기술원 | - |
| dc.subject | Proximity field nanopatterning | - |
| dc.subject | Three dimensional nanosturacture | - |
| dc.subject | phase mask | - |
| dc.subject | phase optics | - |
| dc.subject | 근접장 나노패터닝 | - |
| dc.subject | 위상차 마스크 | - |
| dc.subject | 위상차 조건 | - |
| dc.subject | 삼차원 나노구조 | - |
| dc.subject | diffraction efficiency | - |
| dc.title | Phase shift effect of relief structured phase masks in proximity field nanopatterning | - |
| dc.title.alternative | 근접장 나노패터닝에서 위상차 구조를 갖는 마스크의 단차변화 효과 | - |
| dc.type | Thesis(Master) | - |
| dc.identifier.CNRN | 487416/325007 | - |
| dc.description.department | 한국과학기술원 : 신소재공학과, | - |
| dc.identifier.uid | 020103138 | - |
| dc.contributor.localauthor | Jeon, Seok-Woo | - |
| dc.contributor.localauthor | 전석우 | - |
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