DC Field | Value | Language |
---|---|---|
dc.contributor.advisor | Jeon, Seok-Woo | - |
dc.contributor.advisor | 전석우 | - |
dc.contributor.author | Jang, Byoung-Wook | - |
dc.contributor.author | 장병욱 | - |
dc.date.accessioned | 2013-09-12T04:45:28Z | - |
dc.date.available | 2013-09-12T04:45:28Z | - |
dc.date.issued | 2013 | - |
dc.identifier.uri | http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=515091&flag=dissertation | - |
dc.identifier.uri | http://hdl.handle.net/10203/181988 | - |
dc.description | 학위논문(석사) - 한국과학기술원 : 신소재공학과, 2013.2, [ vi, 55 p. ] | - |
dc.description.abstract | Both single wall carbon nanotube (SWNT) and graphene have exceptionally high carrier mobility, transmittance and flexibility. While some of SWNTs have semiconducting properties depending on their chirality and diameter, graphene has mainly superior metallic properties. Accordingly, with using SWNTs channel and graphene electrodes of transistor, it is realizable to fabricate all carbon based transistor which will be based on realizing flexible display. However, contact resistance between channel (SWNTs) and electrode (graphene) is critical factor which degenerates device performance as various types of transistors did. Precise measurement of contact resistance between graphene and one SWNT will be first step for solving contact resistance issue in all carbon based transistor. Accordingly, in this work, we primary measured contact resistance between one nanotube and graphene using channel length scaling of transistor. For this measurement, we fabricated perfect bottom gated aligned SWNTs transistors with graphene electrodes which have various channel length after growth of high quality monolayer graphene and perfectly aligned SWNT array. Measured values of contact resistance was 21.4kΩ (metallic-SWNT / graphene) and 83.6kΩ (semiconducting-SWNT / graphene), respectively. And then we suggested solutions for lowing contact resistance between them from theoretical analysis of measured values. In conclusion, we showed positive prospect for using graphene electrode in CNTFET in respect of contact resistance, which means that it can get closer to realization to fabricate high performance of all carbon based transistor. | eng |
dc.language | eng | - |
dc.publisher | 한국과학기술원 | - |
dc.subject | Single walled carbon nanotube | - |
dc.subject | Graphene | - |
dc.subject | Contact resistance | - |
dc.subject | transistor | - |
dc.subject | 단일벽 탄소나노튜브 | - |
dc.subject | 그래핀 | - |
dc.subject | 접촉저항 | - |
dc.subject | 트랜지스터 | - |
dc.subject | 채널길이 스케일링 | - |
dc.subject | channel length scaling | - |
dc.title | Contact resistance measurement between single walled carbon nanotube and graphene using channel length scaling of transistor | - |
dc.title.alternative | 트랜지스터의 채널 길이 스케일링을 이용한 단일벽 탄소나노튜브와 그래핀의 접촉 저항 측정 | - |
dc.type | Thesis(Master) | - |
dc.identifier.CNRN | 515091/325007 | - |
dc.description.department | 한국과학기술원 : 신소재공학과, | - |
dc.identifier.uid | 020113528 | - |
dc.contributor.localauthor | Jeon, Seok-Woo | - |
dc.contributor.localauthor | 전석우 | - |
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