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(The) effect of $H_2$ plasma treatment on the film growth rate in catalytic-enhanced Cu CVD = 촉매를 이용한 Cu CVD의 증착속도에 대한 수소 플라즈마의 효과 연구link Kwon, Oh-Kyum; 권오겸; et al, 한국과학기술원, 2001 |
Theoretical evaluation of film growth rate during atomic layer epitaxy Park, Hyung-Sang; Min, Jae-Sik; Lim, Jung-Wook; Kang, Sang-Won, APPLIED SURFACE SCIENCE, v.158, no.1-2, pp.81 - 91, 1999-12 |
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