Browse "Dept. of Materials Science and Engineering(신소재공학과)" by Subject EPITAXIAL COSI2 LAYER
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| Improvement in thermal stability of chemical vapor deposition CoSi 2/polycrystalline silicon using tin and amorphous silicon interlayers Hong J.E.; Kim S.I.; Ahn, Byung Tae; Lee H.S., JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS , v.45, no.2 A, pp.710 - 713, 2006-02 |
| Structural and electrical properties of MOCVD-cobalt silicide on p-Si0.83Ge0.17/Si(001) Shin, DO; Ahn, YS; Ban, SH; Lee, NE; Ahn, Byung Tae; Kim, SH; Shim, KH; et al, MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, v.89, no.1-3, pp.279 - 283, 2002-02 |
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