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Showing results 1 to 5 of 5

1
Atomic Layer Deposition Assisted Pattern Multiplication of Block Copolymer Lithography for 5 nm Scale Nanopatterning

Moon, Hyoung Seok; Kim, Juyoung; Jin, Hyeong Min; Lee, Woo Jae; Choi, Hyeon Jin; Mun, Jeong Ho; Choi, Young Joo; et al, ADVANCED FUNCTIONAL MATERIALS, v.24, no.27, pp.4343 - 4348, 2014-07

2
Directed self-assembly of cylinder-forming diblock copolymers on sparse chemical patterns

Yang, Yong-Biao; Choi, Young Joo; Kim, Sang-Ouk; Kim, Jaeup U., SOFT MATTER, v.11, no.22, pp.4496 - 4506, 2015-06

3
Electric field directed self-assembly of block copolymers for rapid formation of large-area complex nanopatterns

Jeon, Hyun Uk; Jin, Hyeong Min; Kim, Ju Young; Cha, Seung Keun; Mun, Jeong Ho; Lee, Kyung Eun; Oh, Jung Jae; et al, MOLECULAR SYSTEMS DESIGN & ENGINEERING, v.2, no.5, pp.560 - 566, 2017-12

4
Hierarchical Directed Self-Assembly of Diblock Copolymers for Modifi ed Pattern Symmetry

Choi, Young Joo; Kim, Ju Young; Kim, Ji Eun; Mun, Jeong-Ho; Cha, Seung Keun; Kim, Sang Ouk, ADVANCED FUNCTIONAL MATERIALS, v.26, no.35, pp.6462 - 6470, 2016-09

5
Orientation-controlled self-assembled nanolithography using a polystyrene-polydimethylsiloxane block copolymer

Jung, Yeon Sik; Ross, CA, NANO LETTERS, v.7, no.7, pp.2046 - 2050, 2007-07

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