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Effect of CxNy Molecular Species on Carbon Nitride Thin Films Deposited by Radio Frequency Magnetron Sputtering Roh, Kimin; Na, Byung-Keun; Choi, Si-Kyung; Kim, Jung-Hyung; Seong, Dae-Jin; Kim, Jung-Won, JAPANESE JOURNAL OF APPLIED PHYSICS, v.47, no.11, pp.8530 - 8533, 2008-11 |
Reactive ion etching mechanism of RuO2 thin films in oxygen plasma with the addition of CF4, Cl-2, and N-2 Lee, EJ; Kim, JW; Lee, Won-Jong, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.37, no.5A, pp.2634 - 2641, 1998-05 |
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