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Effects of N-2 and NH3 remote plasma nitridation on the structural and electrical characteristics of the HfO2 gate dielectrics Park, Kun-Sik; Baek, K. -H.; Kim, D. P.; Woo, J. -C.; Do, L. -M.; No, Kwang-Soo, APPLIED SURFACE SCIENCE, v.257, no.4, pp.1347 - 1350, 2010-12 |
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