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Effect of Gas Composition on TiN Thin-Film Fabrication in N2/H2/Ar/TiCl4 Inductively Coupled Plasma-Enhanced Chemical Vapor Deposition System Jang, SS; Lee, Won-Jong, JAPANESE JOURNAL OF APPLIED PHYSICS, v.40, no.8, pp.4819 - 4824, 2001-08 |
Efficient Suppression of Defects and Charge Trapping in High Density In-Sn-Zn-O Thin Film Transistor Prepared using Microwave-Assisted Sputter Goh, Youngin; Ahn, Jaehan; Lee, Jeong Rak; Park, Wan Woo; Park, Sang-Hee Ko; Jeon, Sanghun, ACS APPLIED MATERIALS & INTERFACES, v.9, no.42, pp.36962 - 36970, 2017-10 |
Study of shallow silicon trench etch process using planar inductively coupled plasmas Lee, JH; Yeom, GY; Lee, JW; Lee, JeongYong, JOURNAL OF VACUUM SCIENCE TECHNOLOGY A-VACUUM SURFACES AND FILMS, v.15, no.3, pp.573 - 578, 1997-12 |
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