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Reaction characteristics between Cu thin film and RF inductively coupled Cl-2 plasma without/with UV irradiation Kwon, MS; Lee, JeongYong; Choi, KS; Han, CH, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.37, no.7, pp.4103 - 4108, 1998-07 |
Reaction mechanism of low-temperature Cu dry etching using an inductively coupled Cl-2/N-2 plasma with ultraviolet light irradiation Kwon, MS; Lee, JeongYong, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.146, no.8, pp.3119 - 3123, 1999-08 |
Thermodynamic equilibrium calculation of CU(s)-Cl-2(g) reaction Kwon, MS; Lee, JeongYong, APPLIED SURFACE SCIENCE, v.207, pp.158 - 168, 2003-02 |
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