DSpace at KOASAS
Browsing DSpace

Browse "Dept. of Materials Science and Engineering(신소재공학과)" by Author Koh, YB

A to Z

All 0-9

A B C D E F G H I J K L M N O P Q R S T U V W X Y Z

or enter first few letters:

Showing results 1 to 11 of 11

1
A simulation model for thickness profile of the film deposited using planar circular type magnetron sputtering sources

Hong, Daniel Seungbum; Kim, E; Bae, Byeong-Soo; No, Kwangsoo; Lim, SC; Woo, SG; Koh, YB, JOURNAL OF VACUUM SCIENCE TECHNOLOGY A-VACUUM SURFACES AND FILMS, v.14, no.5, pp.2721 - 2727, 1996-09

2
Cr-Based Attenuated Phase Shifting Mask Materials for 193 nm Lithography

No, Kwangsoo; Kim, E; Hong, SB; Jiang, ZT; Lim, S; Woo, SG; Koh, YB, Second Inter. sympo. on 193 nm Lithography86, 1996-01-01

3
Fluorinated silicon nitride film for the bottom antireflective layer in quarter micron optical lithography

Jun, BH; Han, SS; Lee, JS; Kim, YB; Kang, HY; Koh, YB; Bae, Byeong-Soo; et al, SEMICONDUCTOR SCIENCE AND TECHNOLOGY, v.12, no.7, pp.921 - 926, 1997-07

4
Optical property simulation of single-layer halftone phaseshifting masks for DUV microlithography

Jiang, ZT; Hong, Daniel Seungbum; Kim, E; Bae, Byeong-Soo; No, Kwangsoo; Hwangbo, CK; Lim, SC; et al, SEMICONDUCTOR SCIENCE AND TECHNOLOGY, v.11, no.10, pp.1450 - 1455, 1996-10

5
Simulation and fabrication of attenuated phase-shifting masks: CrFx

Kim, E; Hong, Daniel Seungbum; Kim, KS; Jiang, ZT; Kim, DW; Lim, S; Woo, SG; et al, APPLIED OPTICS, v.36, no.28, pp.7247 - 7256, 1997-10

6
Single-Layer Halftone Phase-Shifting Masks for DUV Microlithography : Optical Property Lation and Chromium Compound Film Preparation

No, Kwangsoo; Bae, Byeong-Soo; Jiang, ZT; Song, S; Kim, E; Bae, BS; Lim, SC; et al, Eighth International Conference on Solid Films and Surfaces, 1996-01-01

7
Single-layer halftone phase-shifting masks for DUV microlithography: Optical property simulation and chromium compound film preparation

Jiang, ZT; Hong, Daniel Seungbum; Kim, E; Bae, Byeong-Soo; Lim, S; Woo, SG; Koh, YB; et al, APPLIED SURFACE SCIENCE, v.113, pp.680 - 684, 1997-04

8
Study on Stability of CrFx Flms for Phase Shifting Mask

No, Kwangsoo; Kim, E; Hong, S; Jiang, ZT; Lim, S; Woo, SG; Koh, YB, '97 Photomask , pp.294 - 297, 1997-01-01

9
The Applicability of Fluorinated Silicon Nitride Film as Bottom Antireflective Layer in Deep Ultraviolet Lithography

Bae, Byeong-Soo; No, Kwangsoo; Jun, BH; Han, SS; Kim, DW; Kang, HY; Koh, YB, MRS Symposium, v.446, pp.115 - 120, MRS, 1997

10
The Applicability of SiFxNy Film as Bottom Antireflective Layer in Deep Ultraviolet Lithography

No, Kwangsoo; Bae, Byeong-Soo; Jun, BH; Han, SS; Kim, DW; Kang, HY; Koh, YB, MRS Symp. Proc., pp.115 - 120, Materials Research Society, 1996-01-01

11
Titanium oxide film for the bottom antireflective layer in deep ultraviolet lithography

Jun, BH; Han, SS; Kim, KS; Lee, JS; Jiang, ZT; Bae, Byeong-Soo; No, Kwangsoo; et al, APPLIED OPTICS, v.36, no.7, pp.1482 - 1486, 1997-03

Discover

rss_1.0 rss_2.0 atom_1.0