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TiO2/Al2O3/TiO2 nanolaminated thin films for DRAM capacitor deposited by plasma-enhanced atomic layer deposition Jeon, Woojin; Chung, Hoi-Sung; Joo, Daekwon; Kang, Sang-Won, ELECTROCHEMICAL AND SOLID STATE LETTERS, v.11, no.2, pp.H19 - H21, 2008 |
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