Browse "Dept. of Materials Science and Engineering(신소재공학과)" by Author Jeong, Seong-Jun
Showing results 1 to 31 of 31
| 3D Tailored Crumpling of Block-Copolymer Lithography on Chemically Modified Graphene Kim, Ju-Young; Lim, Joonwon; Jin, Hyeong-Min; Kim, Bong-Hoon; Jeong, Seong-Jun; Choi, Dong-Sung; Li, Dong Jun; et al, ADVANCED MATERIALS, v.28, no.8, pp.1591 - 1596, 2016-02 |
| Bimodal phase separated block copolymer/homopolymer blends self-assembly for hierarchical porous metal nanomesh electrodes Kim, Ju Young; Jin, Hyeong Min; Jeong, Seong-Jun; Chang, Taeyong; Kim, Bong Hoon; Cha, Seung Jeun; Kim, Jun Soo; et al, NANOSCALE, v.10, no.1, pp.100 - 108, 2018-01 |
| Complex High-Aspect-Ratio Metal Nanostructures by Secondary Sputtering Combined with Block Copolymer Self-Assembly Jeon, Hwan-Jin; Kim, Ju Young; Jung, Woo Bin; Jeong, Hyeon-Su; Kim, Yun Ho; Shin, Dong Ok; Jeong, Seong-Jun; et al, ADVANCED MATERIALS, v.28, no.38, pp.8439 - 8445, 2016-10 |
| Directed block copolymer assembly for functional nanomaterials = 기능성 나노재료를 위한 블록공중합체 자기조립제어에 관한 연구link Jeong, Seong-Jun; 정성준; et al, 한국과학기술원, 2010 |
| Directed self-assembly of block copolymers combining top-down and bottom-up approaches Kim, Bong-Hoon; Jeong, Seong-Jun; Shin, Dong-Ok; Park, Seung-Hak; Lee, Hyung-Min; Xia, Guodong; Koo, Chong-Min; et al, ELECTRONIC MATERIALS LETTERS, v.3, no.3, pp.147 - 153, 2007-09 |
Directed self-assembly of block copolymers for next generation nanolithography Jeong, Seong-Jun; Kim, Ju Young; Kim, Bong Hoon; Moon, Hyoung-Seok; Kim, Sang Ouk, MATERIALS TODAY, v.16, no.12, pp.468 - 476, 2013-12 |
| Flash Light Millisecond Self-Assembly of High chi Block Copolymers for Wafer-Scale Sub-10 nm Nanopatterning Jin, Hyeong Min; Park, Dae Yong; Jeong, Seong-Jun; Lee, Gil Yong; Kim, Ju Young; Mun, Jeong Ho; Cha, Seung Keun; et al, ADVANCED MATERIALS, v.29, no.32, 2017-08 |
| Flexible and Transferrable Self-Assembled Nanopatterning on Chemically Modified Graphene Kim, Ju-Young; Kim, Bong-Hoon; Hwang, Jin-Ok; Jeong, Seong-Jun; Shin, Dong-Ok; Mun, Jeong-Ho; Choi, Young-Joo; et al, ADVANCED MATERIALS, v.25, no.9, pp.1331 - 1335, 2013-03 |
| Hierarchical self-assembly of block copolymers for lithography-free nanopatterning Kim, Bong-Hoon; Shin, Dong-Ok; Jeong, Seong-Jun; Koo, Chong-Min; Jeon, Sang-Chul; Hwang, Wook-Jung; Lee, Su-Mi; et al, ADVANCED MATERIALS, v.20, no.12, pp.2303 - 2303, 2008-06 |
| Improved Oxygen Diffusion Barrier Properties of Ruthenium-Titanium Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition Jeong, Seong-Jun; Kim, Doo-In; Kim, Sang Ouk; Han, Tae Hee; Kwon, Jung-Dae; Park, Jin-Seong; Kwon, Se-Hun, JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, v.11, no.1, pp.671 - 674, 2011-01 |
| Improvement of copper diffusion barrier properties of tantalum nitride films by incorporating ruthenium using PEALD Kim, Sung-Wook; Kwon, Se-Hun; Jeong, Seong-Jun; Kang, Sang-Won, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.155, no.11, pp.H885 - H888, 2008-09 |
| Improvement of morphological stability of PEALD-iridium thin films by adopting two-step annealing process Kim, Sung-Wook; Kwon, Se-Hun; Jeong, Seong-Jun; Park, Jin-Seong; Kang, Sang-Won, ELECTROCHEMICAL AND SOLID STATE LETTERS, v.11, no.11, pp.H303 - H305, 2008-09 |
| Improvement of the morphological stability by stacking RuO2 on ru thin films with atomic layer deposition Kwon, Se-Hun; Kwon, Oh-Kyum; Kim, Jae-Hoon; Jeong, Seong-Jun; Kim, Sung-Wook; Kang, Sang-Won, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.154, no.9, pp.H773 - H777, 2007 |
| Large-area, scalable fabrication of conical TiN/GST/TiN nanoarray for low-power phase change memory Yoon, Jong-Moon; Jeong, Hu-Young; Hong, Sung-Hoon; Yin, You; Moon, Hyoung-Seok; Jeong, Seong-Jun; Han, Jun-Hee; et al, JOURNAL OF MATERIALS CHEMISTRY, v.22, no.4, pp.1347 - 1351, 2012-01 |
| Localized surface plasmon resonance coupling in Au nanoparticles/phosphorus dendrimer multilayer thin films fabricated by layer-by-layer self-assembly method Zhao, Wen Bo; Park, Jeongju; Caminade, Anne-Marie; Jeong, Seong-Jun; Jang, Yoon Hee; Kim, Sang Ouk; Majoral, Jean-Pierre; et al, JOURNAL OF MATERIALS CHEMISTRY, v.19, no.14, pp.2006 - 2012, 2009 |
| Nanopatterns with a Square Symmetry from an Orthogonal Lamellar Assembly of Block Copolymers Cha, Seung Keun; Yong, Daeseong; Yang, Geon Gug; Jin, Hyeong Min; Kim, Jang Hwan; Han, Kyuhyo; Kim, Jaeup U.; et al, ACS APPLIED MATERIALS & INTERFACES, v.11, no.22, pp.20265 - 20271, 2019-06 |
| Nanowire random networks Sang Ouk Kim discusses nanopatterning and the directed self-assembly of block copolymers Jeong, Seong-Jun; Kim, Sang-Ouk, MATERIALS TODAY, v.17, no.8, pp.412 - 413, 2014-10 |
| Negative-Tone Block Copolymer Lithography by In Situ Surface Chemical Modification Kim, Bong-Hoon; Byeon, Kyeong-Jae; Kim, Juyoung; Kim, Jinseung; Jin, Hyeong Min; Cho, Joong-Yeon; Jeong, Seong-Jun; et al, SMALL, v.10, no.20, pp.4207 - 4212, 2014 |
| One-Dimensional Metal Nanowire Assembly via Block Copolymer Soft Graphoepitaxy Jeong, Seong-Jun; Moon, Hyoung-Seok; Shin, Jong-Hwa; Kim, Bong-Hoon; Shin, Dong-Ok; Kim, Ju-Young; Lee, Yong-Hee; et al, NANO LETTERS, v.10, no.9, pp.3500 - 3505, 2010-09 |
| One-Dimensional Nanoassembly of Block Copolymers Tailored by Chemically Patterned Surfaces Shin, Dong-Ok; Kim, Bong-Hoon; Kang, Ju-Hyung; Jeong, Seong-Jun; Park, Seung-Hak; Lee, Yong-Hee; Kim, Sang-Ouk, MACROMOLECULES, v.42, no.4, pp.1189 - 1193, 2009-02 |
| Self-Assembly of Complex Multimetal Nanostructures from Perforated Lamellar Block Copolymer Thin Films Cha, Seung Keun; Lee, Gil Yong; Mun, Jeong Ho; Jin, Hyeong Min; Moon, Chang Yun; Kim, Jun Soo; Kim, Kwang Ho; et al, ACS APPLIED MATERIALS & INTERFACES, v.9, no.18, pp.15727 - 15732, 2017-05 |
| Smart Nanostructured Materials based on Self-Assembly of Block Copolymers Kim, Jang Hwan; Jin, Hyeong Min; Yang, Geon Gug; Han, Kyu Hyo; Yun, Taeyeong; Shin, Jin Yong; Jeong, Seong-Jun; et al, ADVANCED FUNCTIONAL MATERIALS, v.30, no.2, 2020-01 |
| Soft Graphoepitaxy of Block Copolymer Assembly with Disposable Photoresist Confinement Jeong, Seong-Jun; Kim, Ji-Eun; Moon, Hyoung-Seok; Kim, Bong-Hoon; Kim, Su-Min; Kim, Jin-Baek; Kim, Sang-Ouk, NANO LETTERS, v.9, no.6, pp.2300 - 2305, 2009-06 |
| Spin coating nanopatterned multielemental materials via self-assembled nanotemplates Xia, Guodong; Jeong, Seong-Jun; Kim, Ji-Eun; Kim, Bong-Hoon; Koo, Chong-Min; Kim, Sang-Ouk, NANOTECHNOLOGY, v.20, no.22, 2009-06 |
| Spontaneous Lamellar Alignment in Thickness-Modulated Block Copolymer Films Kim, Bong-Hoon; Lee, Hyung-Min; Lee, Joo-Hyung; Son, Seung-Woo; Jeong, Seong-Jun; Lee, Su-Mi; Lee, Dong-Il; et al, ADVANCED FUNCTIONAL MATERIALS, v.19, no.16, pp.2584 - 2591, 2009-08 |
| Sub-Nanometer Level Size Tuning of a Monodisperse Nanoparticle Array Via Block Copolymer Lithography Shin, Dong-Ok; Lee, Duck-Hyun; Moon, Hyoung-Seok; Jeong, Seong-Jun; Kim, Ju-Young; Mun, Jeong-Ho; Cho, Hee-Sook; et al, ADVANCED FUNCTIONAL MATERIALS, v.21, no.2, pp.250 - 254, 2011-01 |
| Surface Energy Modification by Spin-Cast, Large-Area Graphene Film for Block Copolymer Lithography Kim, Bong-Hoon; Kim, Ju-Young; Jeong, Seong-Jun; Hwang, Jin-Ok; Lee, Duck-Hyun; Shin, Dong-Ok; Choi, Sung-Yool; et al, ACS NANO, v.4, no.9, pp.5464 - 5470, 2010-09 |
| Ultralarge Area Sub-10-nm Plasmonic Nanogap Array by Block Copolymer Self-Assembly for Reliable High Sensitivity SERS Jin, Hyeong Min; Kim, Ju Young; Heo, MInsung; Jeong, Seong-Jun; Kim, Bong Hoon; Cha, Seung Keun; Han, Kyuhyo; et al, ACS APPLIED MATERIALS & INTERFACES, v.10, no.51, pp.44660 - 44667, 2018-12 |
| Ultralarge-Area Block Copolymer Lithography Enabled by Disposable Photoresist Prepatterning Jeong, Seong-Jun; Moon, Hyoung-Seok; Kim, Bong-Hoon; Kim, Ju-Young; Yu, Jae-Ho; Lee, Su-Mi; Lee, Moon-Gyu; et al, ACS NANO, v.4, no.9, pp.5181 - 5186, 2010-09 |
| Ultralarge-area block copolymer lithography via soft graphoepitaxy Jeong, Seong-Jun; Kim, Sang Ouk, JOURNAL OF MATERIALS CHEMISTRY, v.21, no.16, pp.5856 - 5859, 2011 |
| Universal block copolymer lithography for metals, semiconductors, ceramics, and polymers Jeong, Seong-Jun; Xia, Guodong; Kim, Bong-Hoon; Shin, Dong-Ok; Kwon, Se-Hun; Kim, Sang-Ouk, ADVANCED MATERIALS, v.20, no.10, pp.1898 - 1898, 2008-05 |
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