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Atomic layer deposition of Al2O3 thin films using trimethylaluminum and isopropyl alcohol Jeon, WS; Yang, S; Lee, CS; Kang, Sang-Won, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.149, no.6, pp.306 - 310, 2002-06 |
Interstitial oxygen incorporation into silicon substrate during plasma enhanced atomic layer deposition of Al2O3 Kim, H; Jeon, WS; Jung, SH; Ahn, Byung Tae, ELECTROCHEMICAL AND SOLID STATE LETTERS, v.8, no.10, pp.294 - 296, 2005 |
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