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1
High transmittance attenuated phase shifting mask of chromium aluminum oxynitride

Choi, E; Kim, E; Kim, H; Kim, Y; Tian, H; No, Kwangsoo, PROCEEDINGS OF SPIE - THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING , v.4562 II, no.0, pp.1141 - 1150, 2001

2
High transmittance attenuated phase shifting mask of chromium aluminum oxynitride

Choi, E; Kim, E; Kim, H; Kim, Y; Tian, H; No, Kwangsoo, 21th Annual BACUS Symposium on Photomask Technology, pp.1141 - 1150, 2001-10-03

3
Simulation and characterization of silicon oxynitrofluoride films as a phase shift mask material for 157 nm optical lithography

Kim, S; Choi, E; Kim, H; Kim, J; No, Kwangsoo, Optical Microlithography XV, pp.1696 - 1702, SPIE, 2002-03-06

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