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1
CHARACTERIZATION OF TRIMETHYLALUMINUM-N2O-HE GLOW-DISCHARGE IN PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION OF ALUMINUM-OXIDE FILMS

KIM, YC; CHUN, JS; Lee, Won-Jong, THIN SOLID FILMS, v.258, no.1-2, pp.67 - 74, 1995-03

2
EFFECT OF CHROMIUM IN SUBSTRATE STEEL ON THE CHEMICAL VAPOR-DEPOSITION OF TIC

YOON, SG; Kim, Ho Gi; CHUN, JS, JOURNAL OF MATERIALS SCIENCE, v.22, no.7, pp.2629 - 2634, 1987-07

3
MICROSTRUCTURE AND ELECTRICAL-PROPERTIES OF TANTALUM OXIDE THIN-FILM PREPARED BY ELECTRON-CYCLOTRON-RESONANCE PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION

KIM, I; AHN, SD; CHO, BW; Ahn, SungTae; Lee, JeongYong; CHUN, JS; Lee, Won-Jong, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.33, no.12A, pp.6691 - 6698, 1994-12

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