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1
Deposition characteristics of low dielectric constant SiOF films prepared by ECR PECVD

Byun, KM; Lee, Won-Jong, METALS AND MATERIALS-KOREA, v.6, no.2, pp.155 - 160, 2000-04

2
Thermochemical stability of IrO2 bottom electrodes in direct liquid injection metalorganic chemical vapor deposition of Pb(Zr,Ti)O3 films

Lee, Won-Jong; Byun, KM; Kim, YH, 8th Conference of the European Ceramic Society, pp.8 - 8, 2003

3
Thermochemical stability of IrO2 bottom electrodes in direct-liquid-injection metalorganic chemical vapor deposition of Pb(Zr,Ti)O-3 films

Byun, KM; Lee, Won-Jong, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, v.43, no.5A, pp.2655 - 2660, 2004-05

4
Transformer coupled plasma enhanced metal organic chemical vapor deposition of Ta(Si)N thin films and their Cu diffusion barrier properties

Park, HL; Byun, KM; Lee, Won-Jong, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, v.41, no.10, pp.6153 - 6164, 2002-10

5
Water absorption characteristics of fluorinated silicon oxide films deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition using SiH4, SiF4 and O-2

Byun, KM; Lee, Won-Jong, THIN SOLID FILMS, v.376, no.1-2, pp.26 - 31, 2000-11

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