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Deposition characteristics of low dielectric constant SiOF films prepared by ECR PECVD Byun, KM; Lee, Won-Jong, METALS AND MATERIALS-KOREA, v.6, no.2, pp.155 - 160, 2000-04 |
ECR PECVD법을 이용한 SiOF 박막의 증착 특성 및 유전율 안정화에 관한 연구 = A study on the deposition characteristics and the dielectric stability of the SiOF films deposited by ECR PECVDlink 변경문; Byun, Kyung-Mun; et al, 한국과학기술원, 1999 |
The origin of intrinsic stress and its relaxation for SiOF thin films deposited by electron cyclotron resonance plasma-enhanced chemical vapor deposition Kim, SP; Choi, Si-Kyung, THIN SOLID FILMS, v.379, no.1-2, pp.259 - 264, 2000-12 |
Water absorption characteristics of fluorinated silicon oxide films deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition using SiH4, SiF4 and O-2 Byun, KM; Lee, Won-Jong, THIN SOLID FILMS, v.376, no.1-2, pp.26 - 31, 2000-11 |
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